The Strategy to Fabricate the MTiO3 (M = Sr, Ba) Thin Films by Laser Ablation
The Strategy to Fabricate the MTiO3 (M = Sr, Ba) Thin Films by Laser Ablation
T. M. Im(원광대학교); J. Y. Park(원광대학교); H. J. Kim(원광대학교); H. K. Choi(원광대학교); K. W. Jung*(원광대학교); D. Jung*(원광대학교)
29권 2호, 427~430쪽
초록
BaTiO₃and SrTiO₃thin films were fabricated on Pt/Ti/SiO₂/Si substrate by the pulsed laser deposition process. The dependence of the deposited film quality upon the partial oxygen pressure during the deposition process was importantly examined. Regardless of the oxygen pressure, the as-deposited films were not fully crystallized. However, the film deposited at low oxygen pressure became well crystallized after the annealing process. It was concluded, therefore, that the partial oxygen pressure is reduced as low as possible during the deposition process and then anneal the as-deposited samples at ambient pressure to fabricate the well crystallized SrTiO₃and BaTiO₃films by laser ablation.
Abstract
BaTiO₃and SrTiO₃thin films were fabricated on Pt/Ti/SiO₂/Si substrate by the pulsed laser deposition process. The dependence of the deposited film quality upon the partial oxygen pressure during the deposition process was importantly examined. Regardless of the oxygen pressure, the as-deposited films were not fully crystallized. However, the film deposited at low oxygen pressure became well crystallized after the annealing process. It was concluded, therefore, that the partial oxygen pressure is reduced as low as possible during the deposition process and then anneal the as-deposited samples at ambient pressure to fabricate the well crystallized SrTiO₃and BaTiO₃films by laser ablation.
- 발행기관:
- 대한화학회
- 분류:
- 화학