Inductively coupled plasma assisted D.C. magnetron sputtering 법으로 제작된 TiCrN 코팅층의 특성 분석

Titanium Chromium Nitrided(TiCrN) coatings were deposited on stainless steel 316L and Si(100) wafer by inductively coupled plasma assisted D.C. magnetron sputtering at the various sputtering power on Cr target andN2/Ar gas ratio. XRD, EPMA and FE-SEM were used to investigate the microstructure and chemical component of TiCrN coatings. Hardness and wear resistance were investigated by Micro-Vickers hardness tester and Ball-on-Disk tester, respectively. Increasing the sputtering power of Cr target, XRD pattern were changed from TiCrN(36.8°, 42.7°, 62.3°) to nitride Cr2Ti(39.8°, 43.3°). The maximum hardness was Hk0.3g 3900 at N2/Ar gas ration is 0.3. The thickness of the TiCrN films increased as the Cr target increased, and it showed higher hardness of Hk0.005 3100 at 100W, 150W. TiCrN films shown good wear resistance at the N2/Ar gas ration is 0.1, 0.3.