Galvanic corrosion of aluminum alloy (Al2024) and copper in 1.0M hydrochloric acid solution
Galvanic corrosion of aluminum alloy (Al2024) and copper in 1.0M hydrochloric acid solution
Ahmed Y. Musa(Universiti Kebangsaan Malaysia); Abu Bakar Mohamad(Universiti Kebangsaan Malaysia); Ahmed A. Al-Amiery(Universiti Kebangsaan Malaysia); Lim Tien Tien(Universiti Kebangsaan Malaysia)
29권 6호, 818~822쪽
초록
The corrosion of an aluminum alloy (Al2024) and copper in 1.0M HCl solution was investigated at 30,40, 50 and 60 oC using open circuit potential (OCP), electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization (PDP) measurements. The galvanic corrosion of Al2024 and copper was studied using the zero resistance ammeter (ZRA) method. Galvanic current densities (Ig) and galvanic potential (Eg) were measured at 30 oC in 1.0M HCl solution. Thermodynamic parameters, such as activation energy (Ea), enthalpy of activation (ΔHa) and entropy of activation (ΔSa), were calculated and discussed. The results indicated that the corrosion rates of both Al2024and copper increased with temperature. The ZRA results demonstrated that Al2024 is a sacrificial anode in 1.0M HCl solution when coupled with copper.
Abstract
The corrosion of an aluminum alloy (Al2024) and copper in 1.0M HCl solution was investigated at 30,40, 50 and 60 oC using open circuit potential (OCP), electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization (PDP) measurements. The galvanic corrosion of Al2024 and copper was studied using the zero resistance ammeter (ZRA) method. Galvanic current densities (Ig) and galvanic potential (Eg) were measured at 30 oC in 1.0M HCl solution. Thermodynamic parameters, such as activation energy (Ea), enthalpy of activation (ΔHa) and entropy of activation (ΔSa), were calculated and discussed. The results indicated that the corrosion rates of both Al2024and copper increased with temperature. The ZRA results demonstrated that Al2024 is a sacrificial anode in 1.0M HCl solution when coupled with copper.
- 발행기관:
- 한국화학공학회
- DOI:
- http://dx.doi.org/
- 분류:
- 화학공학